Cushy Adventures

Tour Overview

Everything you need to know about this adventure

Ready to go from your first hike to the summit of Mt. Kenya? Or dreaming of one day standing atop Kilimanjaro? Our Great Ascent Hiking Program is your launchpad.
This structured, guided program is designed to gradually build your strength, stamina, skills, and confidence – turning complete beginners into fully prepared mountaineers in just one season. Whether your end goal is Point Lenana (Mt. Kenya) or to take on Uhuru Peak (Mt. Kilimanjaro) in the future, this program lays the foundation.

Join the Great Ascent Journey – Mt. Kenya Cohort from 2nd to 5th April 2026 via the Sirimon Route. This guided expedition is designed to help adventurers summit Mt. Kenya while building endurance, altitude adaptability, and mental resilience.

Through the Ascent Series prep hikes, participants progressively train on challenging trails across Kenya, ensuring they are fully prepared for the climb. More than a trek, this program focuses on hiking skills, mountain mindset, and community connection, making it the ultimate adventure for anyone ready to test their limits and experience Kenya’s most iconic peak.

Max Elevation

4985M ASL

Elevation Gain

2335M

Trail Grade

Ngong Hills – The Starter Trail (17 Jan 2026): Beginner‑friendly 12.5KM or 23KM hike with Rift Valley views. Mt. Kilimambogo – The Strength Builder (31 Jan 2026): 12KM forested climb to build endurance and leg strength. Mt. Longonot – The Crater Challenge (14 Feb 2026): 14KM crater loop testing stamina on steep, dusty terrain. Mt. Kipipiri – The Altitude Introducer (28 Feb 2026): 18KM high‑altitude trek at 3,300M through Aberdare landscapes. Table Mountain – The Endurance Test (14 Mar 2026): Tough 13KM rocky ascent demanding stamina and summit readiness. Mt. Olesatima x Dragon’s Teeth – The Technical Trainer (28 Mar 2026): 17KM scenic trek blending altitude and technical terrain. Mt. Kenya – Sirimon Route (4‑Day Expedition): Ultimate multi‑day climb to Kenya’s highest peak via Sirimon.